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Hierarchically porous UiO-66 with tunable mesopores and oxygen vacancies for enhanced arsenic removal

Journal of Materials Chemistry A [2020]
Rongming Xu, Qinghua Ji, Pin Zhao, Meipeng Jian, Chao Xiang, Chengzhi Hu, Gong Zhang, Chaochun Tang, Ruiping Liu, Xiwang Zhang, Jiuhui Qu
[10.1039/C9TA13747E]
MATERIALS

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